Chemistry ppm | ||||||||||||
Description | Chief component | Impurities maximum | ||||||||||
Ta | Nb | Fe | Si | Ni | W | Mo | Ti | O | C | H | N | |
Ta1 | Remainder | 300 | 40 | 30 | 20 | 40 | 40 | 20 | 150 | 40 | 15 | 20 |
Ta2 | Remainder | 800 | 100 | 100 | 50 | 200 | 200 | 50 | 200 | 100 | 15 | 100 |
TaNb3 | Remainder | <35000 | 100 | 100 | 50 | 200 | 200 | 50 | 200 | 100 | 15 | 100 |
TaNb20 | Remainder | 170000- 230000 | 100 | 100 | 50 | 200 | 200 | 50 | 200 | 100 | 15 | 100 |
Ta2.5W | Remainder | 400 | 50 | 30 | 20 | 30000 | 60 | 20 | 150 | 50 | 15 | 60 |
Ta10W | Remainder | 400 | 50 | 30 | 20 | 110000 | 60 | 20 | 150 | 50 | 15 | 60 |
Tag: Tungsten Alloy Radiation Shielding | Tungsten Alloy Radiation Shield | Tungsten Heavy Alloy Radiation Shielding | Tungsten Heavy Alloy Radiation Shield
Tag: Tantalum Target For Sputtering | High Precision Tantalum Targets | Tantalum Sputtering Target | Tantalum Target